Inorganic block copolymer lithography

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Scanning probe block copolymer lithography.

Integration of individual nanoparticles into desired spatial arrangements over large areas is a prerequisite for exploiting their unique electrical, optical, and chemical properties. However, positioning single sub-10-nm nanoparticles in a specific location individually on a substrate remains challenging. Herein we have developed a unique approach, termed scanning probe block copolymer lithogra...

متن کامل

Evolution of block copolymer lithography to highly ordered square arrays.

The manufacture of smaller, faster, more efficient microelectronic components is a major scientific and technological challenge, driven in part by a constant need for smaller lithographically defined features and patterns. Traditional self-assembling approaches based on block copolymer lithography spontaneously yield nanometer-sized hexagonal structures, but these features are not consistent wi...

متن کامل

A plasmonic biosensor array by block copolymer lithography†

Highly uniform and dense, hexagonal noble metal nanoparticle arrays were achieved on large-area transparent glass substrates via scalable, parallel processing of block copolymer lithography. Exploring their localized surface plasmon resonance (LSPR) characteristics revealed that the Ag nanoparticle array displayed a UV-vis absorbance spectrum sufficiently narrow and intense for biosensing appli...

متن کامل

Block Copolymer Lithography : Merging “ Bottom - Up ” with “ Top - Down ” Processes

As the size scale of device features becomes ever smaller, conventional lithographic processes become increasingly more difficult and expensive, especially at a minimum feature size of less than 45 nm. Consequently, to achieve higher-density circuits, storage devices, or displays, it is evident that alternative routes need to be developed to circumvent both cost and manufacturing issues. An ide...

متن کامل

Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography

The prolonged and aggressive nature of scaling to augment the performance of silicon integrated circuits (ICs) and the technical challenges and costs associated with this has led to the study of alternative materials that can use processing schemes analogous to semiconductor manufacturing. We examine the status of recent efforts to develop active device elements using nontraditional lithography...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Polymer

سال: 2013

ISSN: 0032-3861

DOI: 10.1016/j.polymer.2012.11.057